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Improvement of amorphous silicon n-i-p solar cells by incorporating double-layer hydrogenated nanocrystalline silicon structure
被引:38
作者:
Liu, Shiyong
[1
]
Zeng, Xiangbo
[1
]
Peng, Wenbo
[1
]
Xiao, Haibo
[1
]
Yao, Wenjie
[1
]
Xie, Xiaobing
[1
]
Wang, Chao
[1
]
Wang, Zhanguo
[1
]
机构:
[1] Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
关键词:
Hydrogenated nanocrystalline silicon;
Buffer layer;
i/p interface;
Solar cells;
OPEN-CIRCUIT VOLTAGE;
A-SI-H;
P/I-INTERFACE;
MICROCRYSTALLINE SILICON;
VAPOR-DEPOSITION;
FILMS;
CAPACITANCE;
EFFICIENCY;
CRYSTALLINE;
TEMPERATURE;
D O I:
10.1016/j.jnoncrysol.2010.10.001
中图分类号:
TQ174 [陶瓷工业];
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
We develop a double-layer p-type hydrogenated nanocrystalline silicon (p-nc-Si:H) structure consisting of a low hydrogen diluted i/p buffer layer and a high hydrogen diluted p-layer to improve the hydrogenated amorphous silicon (a-Si:H) n-i-p solar cells. The electrical, optical and structural properties of p-nc-Si:H films with different hydrogen dilution ratio (R(H)) are investigated. High conductivity, low activation energy and wide band gap are achieved for the thin films. Raman spectroscopy and high-resolution transmission electron microscopy (HRTEM) analyses indicate that the thin films contain nanocrystallites with grain size around 3-5 nm embedded in the amorphous silicon matrix. By inserting a p-nc-Si:H buffer layer at the i/p interface, the overall performance of the solar cell is improved significantly compared to the bufferless cell. The improvement is correlated with the reduction of the density of defect states at the i/p interface. (C) 2010 Elsevier B.V. All rights reserved.
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页码:121 / 125
页数:5
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