Design of cryogenic SiGe low-noise amplifiers

被引:98
作者
Weinreb, Sander [1 ]
Bardin, Joseph C. [1 ]
Mani, Hamdi [1 ]
机构
[1] CALTECH, Dept Elect Engn, Pasadena, CA 91125 USA
基金
美国国家航空航天局;
关键词
cascode; cryogenic; low-noise amplifier (LNA); noise parameters; silicon-germanium (SiGe);
D O I
10.1109/TMTT.2007.907729
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper describes a method for designing cryogenic silicon-germanium (SiGe) transistor low-noise amplifiers and reports record microwave noise temperature, i.e., 2 K, measured at the module connector interface with a 5042 generator. A theory for the relevant noise sources in the transistor is derived from first principles to give the minimum possible noise temperature and optimum generator impedance in terms of dc measured current gain and transconductance. These measured dc quantities are then reported for an IBM SiGe BiCMOS-8HP transistor at temperatures from 295 to 15 K. The measured and modeled noise and gain for both a single- and two-transistor cascode amplifier in the 0.2-3-GHz range are then presented. The noise model is then combined with the transistor equivalent-circuit elements in a circuit simulator and the noise in the frequency range up to 20 GHz is compared with that of a typical InP HEMT.
引用
收藏
页码:2306 / 2312
页数:7
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