High-fluence nitrogen implantation into metals

被引:9
|
作者
Miyagawa, Y
Ikeyama, M
Saitoh, K
Nakao, S
Miyagawa, S
机构
[1] Natl. Indust. Res. Inst. of Nagoya, Nagoya 462, 1-1 Hirate-cho, Kita-ku
来源
SURFACE & COATINGS TECHNOLOGY | 1996年 / 83卷 / 1-3期
关键词
high-fluence nitrogen implantation; dynamic Monte Carlo simulation; implanted nitrogen depth profile; metal sputtering by nitrogen;
D O I
10.1016/0257-8972(95)02814-5
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Nitride ceramics are formed on metal surfaces by high-fluence nitrogen implantation and the mechanical and chemical properties of the surfaces are modified. However, the thickness of the nitride layer is limited by the sputtering effect and the migration of implanted nitrogen towards the surface. In this work, we studied these effects for nitrogen implantation into several kinds of metals (Al, Si, Ti, V, Fe, Co, Ni, Zr, Nb, Mo, Ta and W) by Monte Carlo simulations using the dynamic SASAMAL code in comparison with the experimental results obtained by NRA. The dynamic SASAML code takes into account target alterations which occur under high-fluence implantations, so that dynamic changes in composition, deposited energy, retained probability of the implanted ion, sputtering effects, etc. with fluence can be calculated. For nitrogen implantations into metals, the saturated nitrogen concentration is assumed to equal that of the saturated nitride phase and nitrogen atoms above stoichiometry are assumed to diffuse towards the surface. The depth profiles of nitrogen concentration and the retention of nitrogen obtained by the code agree very well. with the experimental results for 50 keV nitrogen implantations into metals with fluences of 10(17)-10(18) ions cm(-2). The calculated sputtering yields were compared with the semi-empirical values.
引用
收藏
页码:275 / 279
页数:5
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