High energy storage efficiency and thermal stability of A-site-deficient and 110-textured BaTiO3-BiScO3 thin films

被引:22
作者
Abbas, Waseem [1 ]
Ho, Derek [1 ]
Pramanick, Abhijit [1 ]
机构
[1] City Univ Hong Kong, Dept Mat Sci & Engn, Hong Kong, Peoples R China
关键词
ferroelectricity; ferroelectric materials; texture; thin films; X-ray methods; DIELECTRIC-PROPERTIES; BARIUM-TITANATE; DENSITY; CAPACITORS; PERFORMANCE; FATIGUE;
D O I
10.1111/jace.17002
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The development of thin film dielectrics having both high energy density and energy conversion efficiency, as well as good thermal stability, is necessary for practical application in high-temperature power electronics. In addition, there is a demand for the development of new Pb-free high-energy density dielectric materials due to environmental concerns. In this regard, thin films of weakly coupled relaxors based on solid solutions of BaTiO3-BiMeO3 have shown good promise, because they exhibit a remarkably large polarization over a wide temperature range. Nevertheless, the performance of Pb-free thin films has lagged behind that of their Pb-based counterparts in terms of thermal stability and energy conversion efficiency. Toward this end, most recent studies on BaTiO3-BiMeO3 systems have focused on the optimization of material composition, while relatively less attention has been paid to other aspects such as defect chemistry and crystallographic texture. In this study, we examine the effects of A-site vacancy and crystallographic texture on the energy storage performance of BaTiO3-BiScO3 thin films synthesized using pulsed laser deposition (PLD). It is shown that a high energy storage density (W-r) of similar to 28.8 J/cm(3) and a high efficiency of eta >90% are achieved through a combination of moderate A-site vacancy concentration and (110) crystallographic texture. Furthermore, W-r remains nearly temperature independent while a high efficiency of eta >80% is maintained for temperatures up to 200 degrees C, which constitutes one of the best performances for Pb-free ferroelectric films for high-temperature capacitor applications.
引用
收藏
页码:3168 / 3177
页数:10
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