Electrical conductivity of free-standing mesoporous silicon thin films

被引:12
作者
Khardani, M
Bouaïcha, M
Dimassi, W
Zribi, M
Aouida, S
Bessaïs, B
机构
[1] Inst Natl Rech Sci & Tech, Lab Photovolta & Semicond, Hammam Lif, Tunisia
[2] Ecole Natl Ingn Tunis, Lab Photovolta & Mat Semicond, Tunis 1012, Tunisia
关键词
mesoporous silicon; electrical conductivity; EMA;
D O I
10.1016/j.tsf.2005.08.297
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The effective electrical conductivity of free-standing p(+)-type porous silicon layers having porosities ranging from 30% to 80% was studied at both experimental and theoretical sides. An Effective Medium Approximation (EMA) model was used as a theoretical support. The porous silicon (PS) films were prepared by the electrochemical etching method for different values of the anodic current density. In order to model the PS electrical conductivity, the free-standing porous layer was assumed to be formed of three phases; vacuum, oxide and Si nanocrystallites. The analytical expression of the electrical conductivity of the Si nanocrystallites was established using the quantum confinement theory. This enables us to correlate the electrical conductivity of the mesoporous film to the value of the effective band gap energy estimated from the absorption coefficient. A perfect agreement between the theoretical and the experimental electrical conductivity values was obtained for all prospected PS porosities. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:243 / 245
页数:3
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