Photoluminescence of rapid-thermal annealed Mg-doped GaN films

被引:12
作者
Wang, LS
Fong, WK
Surya, C
Cheah, KW
Zheng, WH
Wang, ZG
机构
[1] Hong Kong Polytech Univ, Dept Elect & Informat Engn, Kowloon, Hong Kong, Peoples R China
[2] Hong Kong Baptist Univ, Dept Phys, Hong Kong, Hong Kong, Peoples R China
[3] Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China
关键词
p-type GaN; metalorganic chemical vapor deposition; photoluminescence; X-ray diffraction; rapid-thermal annealing;
D O I
10.1016/S0038-1101(01)00043-0
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report the investigation of temperature and excitation power dependence in photoluminescence spectroscopy measured in Mg-doped GaN epitaxial layers grown on sapphire by metalorganic chemical vapor deposition, The objective is to examine the effects of rapid-thermal annealing on Mg-related emissions. It is observed that the peak position of the 2.7-2.8 eV emission line is a function of the device temperature and annealing conditions, The phenomenon is attributed to Coulomb-potential fluctuations in the conduction and valence band edge and impurity levels due to the Mg-related complex dissociation. The blue shift of the 2.7-2.8 eV emission line with increasing excitation power provides clear evidence that a donor-acceptor recombination process underlies the observed emission spectrum. In addition, quenching of minor peaks at 3.2 and 3.3 eV are observed and their possible origin is discussed. (C) 2001 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:1153 / 1157
页数:5
相关论文
共 24 条
  • [1] AKASAKI I, 1991, J LUMIN, V48-9, P666
  • [2] P-TYPE CONDUCTION IN MG-DOPED GAN TREATED WITH LOW-ENERGY ELECTRON-BEAM IRRADIATION (LEEBI)
    AMANO, H
    KITO, M
    HIRAMATSU, K
    AKASAKI, I
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1989, 28 (12): : L2112 - L2114
  • [3] BAUME P, 1995, APPL PHYS LETT, V67, P1914, DOI 10.1063/1.114566
  • [4] HYDROGENATION OF P-TYPE GALLIUM NITRIDE
    BRANDT, MS
    JOHNSON, NM
    MOLNAR, RJ
    SINGH, R
    MOUSTAKAS, TD
    [J]. APPLIED PHYSICS LETTERS, 1994, 64 (17) : 2264 - 2266
  • [6] ON P-TYPE DOPING IN GAN-ACCEPTOR BINDING-ENERGIES
    FISCHER, S
    WETZEL, C
    HALLER, EE
    MEYER, BK
    [J]. APPLIED PHYSICS LETTERS, 1995, 67 (09) : 1298 - 1300
  • [7] Gotz W, 1996, APPL PHYS LETT, V68, P3470, DOI 10.1063/1.116075
  • [8] GOTZ W, 1996, APPL PHYS LETT, V68, P67
  • [9] Mechanism of donor-acceptor pair recombination in Mg-doped GaN epilayers grown on sapphire substrates
    Kang, TW
    Park, SH
    Song, H
    Kim, TW
    Yoon, GS
    Kim, CO
    [J]. JOURNAL OF APPLIED PHYSICS, 1998, 84 (04) : 2082 - 2085
  • [10] Nature of the 2.8 eV photoluminescence band in Mg doped GaN
    Kaufmann, U
    Kunzer, M
    Maier, M
    Obloh, H
    Ramakrishnan, A
    Santic, B
    Schlotter, P
    [J]. APPLIED PHYSICS LETTERS, 1998, 72 (11) : 1326 - 1328