Preconcentration and determination of osmium(VIII) using silicas chemically modified with sulfur-containing groups

The adsorption of osmium(VIII) from sulfuric and hydrochloric acid solutions and gas phase on silicas chemically modified by dithiocarbamate, thiodiazolthiol, mercaptophenylpropylurea, and aminobenzothiazolpropyl groups is studied. A procedure is developed for the adsorption-photometric determination of osmium, including the adsorption of osmium(VIII) from the gas phase on silicas chemically modified by sulfur-containing groups and the determination of osmium in the adsorbent phase by diffuse reflection spectroscopy. The procedure was used to determine osmium in a certified reference material of the composition of a matte ore thermal melting and process waters.