Theory of adsorption of Cl-2 molecules on GaAs(001) surfaces

被引:18
|
作者
Ohno, T
机构
[1] Natl. Research Institute for Metals, Tsukuba-shi
关键词
adatoms; chemisorption; density functional calculations; etching; gallium arsenide; halogens; surface chemical reaction;
D O I
10.1016/0039-6028(96)00174-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The energetics of the dissociative adsorption of Cl-2 molecules on reconstructed GaAs(001) surfaces is theoretically investigated, employing the first-principles pseudopotential density-functional approach within the generalized gradient approximation. The Cl-2 molecule is found to dissociate with no potential barrier over the Ga dimer on the Ga-rich GaAs(001)-(4 x 2) surface and the Ga dimer is also simultaneously broken upon the Cl-2 dissociative adsorption, resulting in formation of GaCl with two backbonds to the As layer below, On the As-rich (2 x 4) surface, the dissociation of the Cl-2 molecule over the As dimer is an activated process and does not break the As dimer, whereas the Cl-2 dissociation over the As dimer vacancy is a barrierless and exothermic reaction, The geometry and stability of the chlorinated GaAs(001) surface are also discussed. The obtained results are consistent with recent experiments such as temperature-programmed desorption measurements.
引用
收藏
页码:322 / 326
页数:5
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