Theory of adsorption of Cl-2 molecules on GaAs(001) surfaces

被引:18
|
作者
Ohno, T
机构
[1] Natl. Research Institute for Metals, Tsukuba-shi
关键词
adatoms; chemisorption; density functional calculations; etching; gallium arsenide; halogens; surface chemical reaction;
D O I
10.1016/0039-6028(96)00174-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The energetics of the dissociative adsorption of Cl-2 molecules on reconstructed GaAs(001) surfaces is theoretically investigated, employing the first-principles pseudopotential density-functional approach within the generalized gradient approximation. The Cl-2 molecule is found to dissociate with no potential barrier over the Ga dimer on the Ga-rich GaAs(001)-(4 x 2) surface and the Ga dimer is also simultaneously broken upon the Cl-2 dissociative adsorption, resulting in formation of GaCl with two backbonds to the As layer below, On the As-rich (2 x 4) surface, the dissociation of the Cl-2 molecule over the As dimer is an activated process and does not break the As dimer, whereas the Cl-2 dissociation over the As dimer vacancy is a barrierless and exothermic reaction, The geometry and stability of the chlorinated GaAs(001) surface are also discussed. The obtained results are consistent with recent experiments such as temperature-programmed desorption measurements.
引用
收藏
页码:322 / 326
页数:5
相关论文
共 50 条
  • [1] Dissociative adsorption and desorption processes of Cl-2/GaAs(001) surfaces
    Ohno, T
    MATERIALS THEORY, SIMULATIONS, AND PARALLEL ALGORITHMS, 1996, 408 : 451 - 456
  • [2] Theory of adsorption of Cl on GaAs(001) surfaces
    NRIM Research Activities, 1600,
  • [3] Role of surface stoichiometry in the Cl-2/GaAs(001) reaction
    Simpson, WC
    Shuh, DK
    Hung, WH
    Hakansson, MC
    Kanski, J
    Karlsson, UO
    Yarmoff, JA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1996, 14 (03): : 1815 - 1821
  • [4] A contribution of vibrationally excited Cl-2 molecules to GaAs reactive ion etching in Cl-2/Ar
    Moshkalyov, SA
    Machida, M
    Lebedev, SV
    Campos, DO
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1996, 35 (7B): : L940 - L943
  • [5] ETCHING OF GAAS FOR PATTERNING BY IRRADIATION WITH AN ELECTRON-BEAM AND CL-2 MOLECULES
    AKITA, K
    TANEYA, M
    SUGIMOTO, Y
    HIDAKA, H
    KATAYAMA, Y
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1471 - 1474
  • [6] ADSORPTION OF OXYGEN ON GAAS (001) SURFACES BY UPS
    FLAMM, D
    WEBER, EH
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1983, 76 (02): : K163 - K166
  • [7] Cluster model study to the As-2-adsorption on GaAs(001)-surfaces
    Marek, T
    Strunk, HP
    KunsagiMate, S
    Marek, N
    THIN FILMS - STRUCTURE AND MORPHOLOGY, 1997, 441 : 521 - 526
  • [8] Density functional theory study of dissociative adsorption of H2 molecules on NiTi (001) surfaces
    Arifin, Rizal
    Selamat, Ali
    Asih, Retno
    Darminto
    Malyadi, Muhammad
    Putra, Wawan Trisnadi
    PROCEEDINGS OF THE INSTITUTION OF MECHANICAL ENGINEERS PART N-JOURNAL OF NANOMATERIALS NANOENGINEERING AND NANOSYSTEMS, 2024, 238 (1-2) : 75 - 79
  • [9] Characterization of GaAs surfaces subjected to a Cl-2/Ar high density plasma etching process
    Eddy, CR
    Glembocki, OJ
    Shamamian, VA
    Leonhardt, D
    Holm, RT
    Butler, JE
    Thoms, BD
    Pang, SW
    Ko, KK
    Berg, EW
    Stutz, CE
    CONTROL OF SEMICONDUCTOR SURFACES AND INTERFACES, 1997, 448 : 33 - 37
  • [10] Theoretical investigations of adsorption behavior on GaAs(001) surfaces
    Ito, T
    Shiraishi, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1998, 37 (08): : 4234 - 4243