A study on the energy distribution for grid-assisting magnetron sputtering

The Ti film deposited by grid-attached magnetron sputtering possesses rnirror-like surface RMS roughness of 0.6 similar to 1.3 tim. On the other hand, Ti film deposited by conventional magnetron sputtering possesses a steeply increased RMS surface roughness of 6 nm. The cross-sectional TEM micrographs indicated that Ti coating by conventional process was composed of large columnar structures. But Ti coating using two grid-attached magnetron type had a fine structures. By introducing a grid, the energy spectra of ions were characterized by a more extended high energy tail as compared to conventional magnetron sputtering. Therefore, more energetic ion bombardment generally enhances the depositing atom mobility in the case of the grid system as compared to the conventional system. (c) 2005 Elsevier B.V All rights reserved.