Friction properties of amorphous carbon ultrathin films deposited by filtered cathodic vacuum arc and radio-frequency sputtering

被引：27
作者：
Matlak, J. [1 ]
Komvopoulos, K. [1 ]
机构：
[1] Univ Calif Berkeley, Dept Mech Engn, Berkeley, CA 94720 USA
来源：
THIN SOLID FILMS | 2015年 / 579卷
关键词：
Amorphous carbon; Cathodic vacuum arc; Friction; Sputtering; Ultrathin films; DIAMOND-LIKE CARBON; COATINGS; TB/IN(2);
D O I：
10.1016/j.tsf.2014.12.043
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The friction properties of ultrathin films of amorphous carbon (a-C) deposited on Si(100) substrates by filtered cathodic vacuum arc and radio-frequency sputtering were investigated by surface force microscopy. Deposition parameters yielding a-C filmswith high sp(3) content were used to deposit films of thickness between 5 and 35 nm. The coefficient of friction of both types of a-C films was measured with a 1-mu m-radius conical diamond tip and normal loads in the range of 20-640 mu N. The results show a strong dependence of the friction properties on the surface roughness, thickness, and structure of the a-C films, which are influenced by the intricacies of the deposition method. The dependence of the coefficient of friction on normal load and the dominance of adhesion and plowing friction mechanisms are interpreted in terms of the through-thickness variation of carbon atom hybridization of the a-C films. (C) 2015 Elsevier B.V. All rights reserved.
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页码：167 / 173
页数：7
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