Ultraviolet-oxidized mercaptan-terminated organosilane nanolayers as diffusion barriers at Cu-silica interfaces

被引:19
作者
Gandhi, D. D.
Tisch, U.
Singh, B.
Eizenberg, M.
Ramanath, G. [1 ]
机构
[1] Rensselaer Polytech Inst, Dept Mat Sci & Engn, Troy, NY 12180 USA
[2] Technion Israel Inst Technol, Dept Mat Engn, IL-32000 Haifa, Israel
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.2760164
中图分类号
O59 [应用物理学];
学科分类号
摘要
We demonstrate the use of UV-exposed molecular nanolayers (MNLs) of 3-mercaptan-propyl-trimethoxysilane to inhibit copper-transport across Cu-SiO2 interfaces more efficiently than the pristine MNLs. Bias-thermal-annealing tests of Cu/MNL/SiO2/Si(001)/Al capacitors, with MNLs exposed to 254 nm UV radiation, exhibit enhanced barrier properties to Cu diffusion, when compared with capacitors with MNLs not exposed to UV light. X-ray photoelectron spectroscopy reveals that UV exposure converts the mercaptan termini to sulfonates, which are more effective in inhibiting Cu diffusion. Our findings are of importance for tailoring the chemical and mechanical integrity of interfaces for use in applications such as nanodevice wiring and molecular electronics. (c) 2007 American Institute of Physics.
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页数:3
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