Energy location of light-induced ESR centers in undoped a-Si:H

被引:4
|
作者
Umeda, T
Yamasaki, S
Isoya, J
Matsuda, A
Tanaka, K
机构
[1] Natl Inst Adv Interdisciplinary Res, Joint Res Ctr Atom Technol, Tsukuba, Ibaraki 305, Japan
[2] Univ Tsukuba, Inst Mat Sci, Tsukuba, Ibaraki 305, Japan
[3] Electrotech Lab, Tsukuba, Ibaraki 305, Japan
关键词
hydrogenated amorphous silicon; light-induced electron-spin resonance; energy shift; (29)Si hyperfine structure;
D O I
10.1016/S0022-3093(98)00075-1
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We report the light intensity dependence of (29)Si hyperfine (hf) structures of light-induced electron spin resonance (LESR) in undoped a-Si:H in order to detect changes of electronic structures of the g = 2.004 center against the shift of energy locations of g = 2.004 electrons. Within the light intensity range from 0.004 to 450 mW/cm(2), (29)Si hf structures of g = 2.004 were almost unchanged, which indicates that a magnitude of the spatial localization of g = 2.004 electrons is almost constant. Based on the experimental results, we discuss the energetic distribution of g = 2.004 electrons. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:353 / 357
页数:5
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