Pulse enhanced electron emission (P3e™) arc evaporation and the synthesis of wear resistant Al-Cr-O coatings in corundum structure

被引:94
作者
Ramm, Juegen [1 ]
Ante, Michael [1 ]
Bachmann, Theo [1 ]
Widrig, Beno [1 ]
Brandle, Hans [1 ]
Doebeli, Max [2 ,3 ]
机构
[1] OC Oerlikon Balzers AG, LI-9496 Balzers, Liechtenstein
[2] Paul Scherrer Inst, CH-8093 Zurich, Switzerland
[3] ETH, CH-8093 Zurich, Switzerland
关键词
cathodic arc; metal oxide; solid solution; corundum; thermal stability;
D O I
10.1016/j.surfcoat.2007.05.044
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Pulse enhanced electron emission (P3e (TM)) is a new approach in PVD technology for the deposition of metal oxides. The process is dedicated to the formation of alumina-based and other metallic oxide layers and comprises high current pulse technique for the arc sources. The method allows a deposition of hard alumina-based coatings at substrate temperatures below 600 degrees C. Different oxide layers and layer combinations were prepared with this new technique illustrating the enormous potential for the design of wear resistant coatings. The layers were characterized with respect to hardness, stress, composition, crystal structure, and thermal stability. Solid solutions of (Al1-xCrx)(2)O-3 could be synthesized for a composition range of 0.3 <= 5x<l. The growth of the solid solutions has also been demonstrated at TiCN and TiAlN interfaces. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:876 / 883
页数:8
相关论文
共 26 条
[1]   Phase control of Al2O3 thin films grown at low temperatures [J].
Andersson, J. M. ;
Wallin, E. ;
Helmersson, U. ;
Kreissig, U. ;
Munger, E. P. .
THIN SOLID FILMS, 2006, 513 (1-2) :57-59
[2]   Microstructure of α-alumina thin films deposited at low temperatures on chromia template layers [J].
Andersson, JM ;
Czigány, Z ;
Jin, P ;
Helmersson, U .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2004, 22 (01) :117-121
[3]  
[Anonymous], 2002, ISO145771
[4]   Experimental and theoretical studies of the low-temperature growth of chromia and alumina [J].
Ashenford, DE ;
Long, F ;
Hagston, WE ;
Lunn, B ;
Matthews, A .
SURFACE & COATINGS TECHNOLOGY, 1999, 116 :699-704
[5]   PVD-Al2O3-coated cemented carbide cutting tools [J].
Åstrand, M ;
Selinder, TI ;
Fietzke, F ;
Klosterman, H .
SURFACE & COATINGS TECHNOLOGY, 2004, 188 (1-3 SPEC.ISS.) :186-192
[6]   Crystal structure characterisation of filtered arc deposited alumina coatings: temperature and bias voltage [J].
Brill, R ;
Koch, F ;
Mazurelle, J ;
Levchuk, D ;
Balden, M ;
Yamada-Takamura, Y ;
Maier, H ;
Bolt, H .
SURFACE & COATINGS TECHNOLOGY, 2003, 174 :606-610
[7]   Influence of the pulsing of the current of a vacuum arc on rate and droplets [J].
Büschel, M ;
Grimm, W .
SURFACE & COATINGS TECHNOLOGY, 2001, 142 :665-668
[8]  
Chu W. K., 1978, Backscattering Spectrometry
[10]  
FREUND LB, 2006, THIN FILM MAT, P60