Effect of Zr Content on the Wake-Up Effect in Hf1-xZrxO2 Films

被引:209
作者
Park, Min Hyuk [1 ,2 ,3 ]
Kim, Han Joon [1 ,2 ]
Kim, Yu Jin [1 ,2 ]
Lee, Young Hwan [1 ,2 ]
Moon, Taehwan [1 ,2 ]
Do Kim, Keum [1 ,2 ]
Hyun, Seung Dam [1 ,2 ]
Fengler, Franz [3 ]
Schroeder, Uwe [3 ]
Hwang, Cheol Seong [1 ,2 ]
机构
[1] Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
[2] Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South Korea
[3] NaMLab gGmbH, Noethnitzer Str 64, D-01187 Dresden, Germany
基金
新加坡国家研究基金会;
关键词
hafnium oxide; ferroelectrics; wake-up; endurance; nonvolatile memory; NEGATIVE CAPACITANCE; HF0.5ZR0.5O2; FILMS; FERROELECTRICITY; VOLTAGE; FIELD; ENDURANCE; LAYER;
D O I
10.1021/acsami.6b03586
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In this study, the changes in the structural and electrical properties of ferroelectric Hf1-xZrxO2 films with various Zr contents (0.26-0.70) were systematically examined during electric field cycling, resulting in a "wake-up" effect. To quantify the degree of wake-up effect, a "variable" polarization as the difference between remanent and saturation polarization was suggested as a new parameter, which could be calculated by excluding the linear dielectric contribution from the total electric displacement. Here, the variable polarization value could be minimized for an optimized Zr content of 0.43, which was slightly lower than the value for the largest remanent polarization. The polymorphism in Hf1-xZrxO2 thin films is known to be complicated due to the relatively small energy differences between various phases, such as the monoclinic, tetragonal, and orthorhombic phases. The variations in the polarization-electric field characteristics and dielectric constant values could be qualitatively and quantitatively understood based on the competition of various polymorphs that are dependent on the Zr content. Furthermore, a schematic model for the spatial distribution of mixed phases was suggested for Hf1-xZrxO2 films with various Zr contents based on the experimental observations.
引用
收藏
页码:15466 / 15475
页数:10
相关论文
共 36 条
[31]   Complex Internal Bias Fields in Ferroelectric Hafnium Oxide [J].
Schenk, Tony ;
Hoffmann, Michael ;
Ocker, Johannes ;
Pesic, Milan ;
Mikolajick, Thomas ;
Schroeder, Uwe .
ACS APPLIED MATERIALS & INTERFACES, 2015, 7 (36) :20224-20233
[32]   Electric Field Cycling Behavior of Ferroelectric Hafnium Oxide [J].
Schenk, Tony ;
Schroeder, Uwe ;
Pesic, Milan ;
Popovici, Mihaela ;
Pershin, Yuriy V. ;
Mikolajick, Thomas .
ACS APPLIED MATERIALS & INTERFACES, 2014, 6 (22) :19744-19751
[33]   Alternative interpretations for decreasing voltage with increasing charge in ferroelectric capacitors [J].
Song, Seul Ji ;
Kim, Yu Jin ;
Park, Min Hyuk ;
Lee, Young Hwan ;
Kim, Han Joon ;
Moon, Taehwan ;
Do Kim, Keum ;
Choi, Jung-Hae ;
Chen, Zhihui ;
Jiang, Anquan ;
Hwang, Cheol Seong .
SCIENTIFIC REPORTS, 2016, 6
[34]   Evidence for oxygen vacancies movement during wake-up in ferroelectric hafnium oxide [J].
Starschich, S. ;
Menzel, S. ;
Boettger, U. .
APPLIED PHYSICS LETTERS, 2016, 108 (03)
[35]   IDENTIFICATION OF PASSIVE LAYER IN FERROELECTRIC THIN-FILMS FROM THEIR SWITCHING PARAMETERS [J].
TAGANTSEV, AK ;
LANDIVAR, M ;
COLLA, E ;
SETTER, N .
JOURNAL OF APPLIED PHYSICS, 1995, 78 (04) :2623-2630
[36]   Wake-up effects in Si-doped hafnium oxide ferroelectric thin films [J].
Zhou, Dayu ;
Xu, Jin ;
Li, Qing ;
Guan, Yan ;
Cao, Fei ;
Dong, Xianlin ;
Mueller, Johannes ;
Schenk, Tony ;
Schroeder, Uwe .
APPLIED PHYSICS LETTERS, 2013, 103 (19)