Effect of Zr Content on the Wake-Up Effect in Hf1-xZrxO2 Films
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作者:
Park, Min Hyuk
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Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South Korea
NaMLab gGmbH, Noethnitzer Str 64, D-01187 Dresden, GermanySeoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
Park, Min Hyuk
[1
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Kim, Han Joon
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Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
Kim, Han Joon
[1
,2
]
Kim, Yu Jin
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Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
Kim, Yu Jin
[1
,2
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Lee, Young Hwan
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Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
Lee, Young Hwan
[1
,2
]
Moon, Taehwan
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Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
Moon, Taehwan
[1
,2
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Do Kim, Keum
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Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
Do Kim, Keum
[1
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Hyun, Seung Dam
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Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
Hyun, Seung Dam
[1
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Fengler, Franz
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NaMLab gGmbH, Noethnitzer Str 64, D-01187 Dresden, GermanySeoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
Fengler, Franz
[3
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Schroeder, Uwe
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NaMLab gGmbH, Noethnitzer Str 64, D-01187 Dresden, GermanySeoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
Schroeder, Uwe
[3
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Hwang, Cheol Seong
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Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
Hwang, Cheol Seong
[1
,2
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机构:
[1] Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
[2] Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South Korea
In this study, the changes in the structural and electrical properties of ferroelectric Hf1-xZrxO2 films with various Zr contents (0.26-0.70) were systematically examined during electric field cycling, resulting in a "wake-up" effect. To quantify the degree of wake-up effect, a "variable" polarization as the difference between remanent and saturation polarization was suggested as a new parameter, which could be calculated by excluding the linear dielectric contribution from the total electric displacement. Here, the variable polarization value could be minimized for an optimized Zr content of 0.43, which was slightly lower than the value for the largest remanent polarization. The polymorphism in Hf1-xZrxO2 thin films is known to be complicated due to the relatively small energy differences between various phases, such as the monoclinic, tetragonal, and orthorhombic phases. The variations in the polarization-electric field characteristics and dielectric constant values could be qualitatively and quantitatively understood based on the competition of various polymorphs that are dependent on the Zr content. Furthermore, a schematic model for the spatial distribution of mixed phases was suggested for Hf1-xZrxO2 films with various Zr contents based on the experimental observations.