Chemical vapour deposition of diamond

被引：2
|
作者：
Marinkovic, SN
机构：
来源：
ADVANCED MATERIALS FOR HIGH TECHNOLOGY APPLICATIONS | 1996年 / 214卷
关键词：
CVD diamond; combustion flame CVD; plasma jet CVD; diamond film;
D O I：
10.4028/www.scientific.net/MSF.214.171
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Research concerning chemical vapour deposition of diamond at the Institute of Nuclear Sciences ''Vinca'' is reviewed. Combustion flame and d.c. plasma jet CVD methods have been used. The research subjects include studies concerning diamond characterization, oriented growth of diamond coatings, formation of large crystals, coating cemented cutting tools by diamond, deposition of diamond using plasma jet, and analysis of d.c. jet thermal plasma.
引用
收藏
页码：171 / 178
页数：8
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