Iodine doping in solid precursor-based CVD growth graphene film

被引:104
作者
Kalita, Golap [1 ]
Wakita, Koichi [1 ]
Takahashi, Makoto [2 ]
Umeno, Masayoshi [2 ]
机构
[1] Chubu Univ, Elect & Informat Engn Dept, Kasugai, Aichi 4878501, Japan
[2] Chubu Univ, Dept Appl Chem, Kasugai, Aichi 4878501, Japan
关键词
CHEMICAL-VAPOR-DEPOSITION; AMORPHOUS-CARBON; PHASE; TRANSPARENT;
D O I
10.1039/c1jm13268g
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Doping of different elements in intrinsic graphene is of great importance to adjust the electrical and chemical properties for realization of different electronic devices. Here, we demonstrate a simple and controllable synthesis process of iodine-doped graphene film using camphor (C(10)H(16)O), a solid botanical derivative. In situ doping of iodine in a graphene film has many difficulties in a conventional chemical vapor deposition process using a gas source. In this technique, iodine was mixed with the carbon precursor and simultaneously evaporated to pyrolysis on a metal catalytic substrate. Raman and X-ray photoelectron spectroscopic studies confirm the presence of elemental iodine in the form of triiodide and pentaiodide. Simultaneously, evaporated iodine atoms remains within the few-layers graphene structure and interact with carbon atoms through a charge transfer process. This shows a straightforward technique for iodine doping in graphene and a similar approach can be adopted to deposit iodine-doped graphene on other metal substrates.
引用
收藏
页码:15209 / 15213
页数:5
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