Deformation of an Elastic Substrate by a Three-Phase Contact Line

被引:239
|
作者
Jerison, Elizabeth R. [1 ]
Xu, Ye [2 ]
Wilen, Larry A. [3 ]
Dufresne, Eric R. [2 ,4 ,5 ,6 ]
机构
[1] Yale Univ, Dept Phys, New Haven, CT 06520 USA
[2] Yale Univ, Dept Mech Engn & Mat Sci, New Haven, CT 06520 USA
[3] Unilever Res Labs, Trumbull, CT 06611 USA
[4] Yale Univ, Dept Chem & Environm Engn, New Haven, CT 06520 USA
[5] Yale Univ, Dept Phys, New Haven, CT 06520 USA
[6] Yale Univ, Dept Cell Biol, New Haven, CT 06520 USA
关键词
MICROSCOPY; INTERFACE;
D O I
10.1103/PhysRevLett.106.186103
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Young's classic analysis of the equilibrium of a three-phase contact line ignores the out-of-plane component of the liquid-vapor surface tension. While it is expected that this unresolved force is balanced by the elastic response of the solid, a definitive analysis has remained elusive because of an apparent divergence of stress at the contact line. While a number of theories have been presented to cut off the divergence, none of them have provided reasonable agreement with experimental data. We measure surface and bulk deformation of a thin elastic film near a three-phase contact line using fluorescence confocal microscopy. The out-of-plane deformation is well fit by a linear elastic theory incorporating an out-of-plane restoring force due to the surface tension of the solid substrate. This theory predicts that the deformation profile near the contact line is scale-free and independent of the substrate elastic modulus.
引用
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页数:4
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