Understanding current transport at the Ni/GaN interface using low-frequency noise spectroscopy

被引:10
作者
Kumar, Ashutosh [1 ,2 ]
Kumar, V. [2 ,3 ]
Singh, R. [1 ,2 ]
机构
[1] Indian Inst Technol Delhi, Dept Phys, Hauz Khas, New Delhi 110016, India
[2] Indian Inst Technol Delhi, Nanoscale Res Facil, Hauz Khas, New Delhi 110016, India
[3] Indian Inst Technol Delhi, Ctr Appl Res Elect, Hauz Khas, New Delhi 110016, India
关键词
Ni/GaN Schottky diode; interface traps; barrier inhomogeneities; generation-recombination noise; 1/f noise; FIELD-EFFECT TRANSISTORS; GATE LEAKAGE CURRENT; 1/F NOISE; SCHOTTKY CONTACTS; GALLIUM-NITRIDE; FLICKER-NOISE; TUNNEL-DIODES; GAN FILMS; SAPPHIRE; EMISSION;
D O I
10.1088/0022-3727/49/47/47LT01
中图分类号
O59 [应用物理学];
学科分类号
摘要
The non-ideal behaviour of the GaN-based Schottky diode is in general attributed to the combined effect of interface traps and barrier inhomogeneities at the metal/GaN interface. In our present work, we determine the relative contribution of these two non-idealities to electronic transport in Schottky barrier diodes, by using bias-dependent low-frequency noise measurements. Due to the single-trap-dominated electronic transport at lower bias, the noise spectra turn out to be Lorentzian, whereas the distribution in time constants available for interface states due to barrier inhomogeneities causes a deviation from Lorentzian towards a 1/f-type noise spectrum in higher bias regions. The present study indicates that the shape of the noise spectrum, its level and variation with the applied bias, determine the dominant current transport mechanism at the Ni/GaN interface, which may be useful for improving the electrical behaviour of metal/GaN interfaces.
引用
收藏
页码:1 / 7
页数:7
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