Temperature influence on deuterium retention for Be-W mixed thin films prepared by Thermionic Vacuum Arc method exposed to PISCES B plasma

被引:13
作者
Jepu, I. [1 ]
Doerner, R. P. [2 ]
Baldwin, M. J. [2 ]
Porosnicu, C. [1 ]
Lungu, C. P. [1 ]
机构
[1] NILPRP, Bucharest 077125, Romania
[2] Univ Calif San Diego, Energy Res Ctr, La Jolla, CA 92093 USA
关键词
Thin films - Binary alloys - Film preparation - Vacuum applications - Deuterium - Tungsten alloys - Vacuum technology;
D O I
10.1016/j.jnucmat.2014.10.029
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Beryllium-tungsten thin films with well controlled elemental composition were prepared using Thermionic Vacuum Arc (TVA) technique and subsequently exposed to steady state, high ion flux (5.5 - 9.8 x 10(22) ions m(-2) s(-1)) deuterium (D) plasma in the PISCES-B facility to consistent fluences of 2.3 x 10(26) m(-2). Six types of layers were studied, ranging from pure Be, composite Be-W, having the atomic ratios of 9:1; 7:3; 1:1; 3:7; to pure W with a total deposited layer thickness of 2 mu m. The sample exposure temperatures, namely 300 K, 473 K, 573 K and 773 K, respectively, were measured in situ with a thermocouple placed on the back of the sample. Morphological and structural examinations were undertaken before and after plasma exposure. Results show an influence of temperature on the subsequent morphology of the surface. Thermal Desorption Spectrometry (TDS) spectra showed a change in the D release behavior for different Be-W ratio for a certain exposure temperature. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:983 / 988
页数:6
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