Factors affecting phase and height contrast of diblock copolymer PS-b-PEO thin films in dynamic force mode atomic force microscopy

被引:29
作者
Wang, H
Djurisic, AB
Chan, WK
Xie, MH
机构
[1] Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
[2] Univ Hong Kong, Dept Chem, Hong Kong, Hong Kong, Peoples R China
关键词
atomic force microscopy; phase contrast; block copolymers;
D O I
10.1016/j.apsusc.2005.02.034
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Asymmetric PS-b-PEO block copolymer exhibits well-ordered cylindrical morphology with nanoscale domain sizes due to microphase separation. Since the PS and PEO blocks have large stiffness difference, this polymer system represents an ideal candidate for studies of the phase contrast behavior in atomic force microscopy (AFM). In this paper, PS-b-PEO films are investigated under different scanning conditions using two different atomic force microscopes. It is found that the phase contrast of the film can be well described in terms of energy dissipation, though the exact phase image may also depend on the scanning parameters (e.g., the repulsive versus attractive regimes) as well as the settings of the microscope. Height variation on sample surface does not have significant effect on phase contrast. However, in order to obtain true topography of the polymer film, care has to be taken to avoid damage to the sample by AFM. Under certain conditions, true topography can be obtained during the first scan in spite of the surface-damaging forces are used. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:1092 / 1100
页数:9
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