Fabrication of square spiral photonic crystals by Glancing Angle Deposition

被引：2

作者：

Kennedy, SR ^{[1
]}

Brett, MJ ^{[1
]}

Toader, O ^{[1
]}

John, S ^{[1
]}

机构：

[1] Univ Alberta, Dept Elect & Comp Engn, Edmonton, AB T6G 2V4, Canada

来源：

10TH INTERNATIONAL SYMPOSIUM ON NANOSTRUCTURES: PHYSICS AND TECHNOLOGY | 2003年 / 5023卷

关键词：

fabrication; thin films; photonic band gap crystal; electromagnetic propagation; silicon;

D O I：

10.1117/12.511549

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Using Glancing Angle Deposition, a novel thin film deposition technique, it is possible to fabricate complex, periodic structures suited for applications in photonic band gap crystals. In comparison to complex lithography processes used to produce conventional structures on the scale of several nanometers, GLAD is ideally suited to a virtual single step deposition, producing a novel tetragonal square spiral crystal structure and having a large predicted band gap of up to 15%.

引用

页码：101 / 104

页数：4

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