Evidence for Vacancy-Related Recombination Active Defects in as-Grown N-Type Czochralski Silicon

被引:8
|
作者
Zheng, P. [1 ]
Rougieux, F. E. [1 ]
Grant, N. E. [1 ]
Macdonald, D. [1 ]
机构
[1] Australian Natl Univ, Res Sch Engn, Coll Engn & Comp Sci, Canberra, ACT 0200, Australia
来源
IEEE JOURNAL OF PHOTOVOLTAICS | 2015年 / 5卷 / 01期
基金
澳大利亚研究理事会;
关键词
As-grown; Czochralski (Cz); defects; silicon; POINT-DEFECTS; P-TYPE; IMPURITIES; WAFERS;
D O I
10.1109/JPHOTOV.2014.2366687
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
A recombination of active defect in very high lifetime Czochralski grown n-type silicon wafers, which can be thermally deactivated at 150 degrees C, is described. In addition, the existence of a recently measured defect, which is deactivated at 350 degrees C, is confirmed. Both defects are found to significantly degrade the lifetime of millisecond-range Czochralski-grownn-type silicon wafers: a material widely used for high-efficiency solar cells. The observed deactivation temperature suggests that it may be caused by vacancy-phosphorus pairs. The deactivation temperature of the second defect is consistent with the presence of vacancy-oxygen (V-O) pairs.
引用
收藏
页码:183 / 188
页数:6
相关论文
共 50 条
  • [21] Annealing kinetics of vacancy-related defects in low-dose MeV self-ion-implanted n-type silicon -: art. no. 195211
    Pellegrino, P
    Lévêque, P
    Lalita, J
    Hallén, A
    Jagadish, C
    Svensson, BG
    PHYSICAL REVIEW B, 2001, 64 (19)
  • [22] NEW DONOR FORMATION IN n-TYPE CZOCHRALSKI-GROWN SILICON.
    Fukuoka, Noboru
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes, 1985, 24 (11): : 1450 - 1453
  • [23] High resolution structure imaging of octahedral void defects in as-grown Czochralski silicon
    Bender, H
    Vanhellemont, J
    Schmolke, R
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1997, 36 (9AB): : L1217 - L1220
  • [24] Recombination Centers Resulting from Reactions of Hydrogen and Oxygen in n-type Czochralski Silicon
    Markevich, V. P.
    Contreras, M. Vaqueiro
    Mullins, J.
    Halsall, M.
    Hamilton, B.
    Murin, L. I.
    Falster, R.
    Binns, J.
    Good, E.
    Coutinho, J.
    Medford, J.
    Reynolds, C. L., Jr.
    Peaker, A. R.
    2016 IEEE 43RD PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC), 2016, : 688 - 693
  • [25] Electron paramagnetic resonance studies of a carbon vacancy-related defect in as-grown 4H-SiC
    Konovalov, VV
    Zvanut, ME
    Tsvetkov, VF
    Jenny, JR
    Müller, SG
    McDhobgood, H
    PHYSICA B-CONDENSED MATTER, 2001, 308 (308-310) : 671 - 674
  • [26] ELECTRICALLY ACTIVE INTERSTITIAL DEFECTS IN IRRADIATED N-TYPE SILICON
    LITVINKO, AG
    MAKARENKO, LF
    MURIN, LI
    TKACHEV, VD
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1980, 14 (04): : 455 - 457
  • [27] OPTICAL DETERMINATION OF OXYGEN OUTDIFFUSION IN EPITAXIAL SILICON GROWN ON N-TYPE CZOCHRALSKI SUBSTRATES
    GEDDO, M
    PIVAC, B
    BORGHESI, A
    STELLA, A
    PEDROTTI, M
    APPLIED PHYSICS LETTERS, 1990, 57 (15) : 1511 - 1513
  • [28] Secondary defects of as-grown oxygen precipitates in nitrogen doped Czochralski single crystal silicon
    Tuo, Huan
    Liu, Yun
    Li, Minghao
    Dai, Rongwang
    Wang, Hao
    Yu, Yuehui
    Xue, Zhongying
    Wei, Xing
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2023, 163
  • [29] Complete regeneration of BO-related defects in n-type upgraded metallurgical-grade Czochralski-grown silicon heterojunction solar cells
    Sun, Chang
    Chen, Daniel
    Weigand, William
    Basnet, Rabin
    Phang, Sieu Pheng
    Hallam, Brett
    Holman, Zachary C.
    Macdonald, Daniel
    APPLIED PHYSICS LETTERS, 2018, 113 (15)
  • [30] Origin of Ga vacancy-related YL center in n-type GaN: A first-principles study
    Wang, Qian-Ji
    Zhang, Hai-Shan
    Shi, Lin
    Gong, Jian
    JOURNAL OF LUMINESCENCE, 2023, 255