Preparation of ZnS-CdS alloy quantum dots by chemical synthetic methods and size-selective photoetching effects on size distribution

被引：13

作者：

Kim, DG ^{[1
]}

Nabeshima, A ^{[1
]}

Nakayama, M ^{[1
]}

机构：

[1] Osaka City Univ, Grad Sch Engn, Dept Appl Phys, Sumiyoshi Ku, Osaka 5588585, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2005年 / 44卷 / 03期

关键词：

ZnS-CdS alloy; quantum dot; size-selective photoetching; reverse-micelle method; colloidal method;

D O I：

10.1143/JJAP.44.1514

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have prepared ZnS-CdS alloy (Zn(1-x)Cd(x)S) quantum dots (QDs) using chemical synthetic methods and investigated sizeselective photoetching effects on the size distribution. The preparation of Zn(1-x)Cd(x)S QDs with an alloy composition from x = 0 to x = 1 is successful using either of the following two methods: a reverse-micelle method using AOT/heptane micellar solutions, and a standard colloidal method in aqueous polyvinyl pyrrolidone solution. Reduction of the size distribution of the colloidal alloy QD to similar to 5% was achieved by a size-selective photoetching process. The present results indicate the potential of preparing Zn(1-x)Cd(x)S QDs with a narrow size distribution.

引用

页码：1514 / 1517

页数：4

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