Integrating Structural Colors with Additive Manufacturing Using Atomic Layer Deposition

被引:13
作者
Rorem, Benjamin A. [1 ]
Cho, Tae H. [2 ]
Farjam, Nazanin [2 ]
Lenef, Julia D. [3 ]
Barton, Kira [2 ]
Dasgupta, Neil P. [2 ,3 ]
Guo, L. Jay [1 ,2 ,4 ]
机构
[1] Univ Michigan, Dept Appl Phys, Ann Arbor, MI 48109 USA
[2] Univ Michigan, Dept Mech Engn, Ann Arbor, MI 48109 USA
[3] Univ Michigan, Dept Mat Sci & Engn, Ann Arbor, MI 48109 USA
[4] Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA
基金
美国国家科学基金会;
关键词
structural color; additive manufacturing; Fabry-Pe?rot; atomic layer deposition; electrohydrodynamic jet printing; area-selective deposition; OXIDE SEMICONDUCTORS; HIGH-EFFICIENCY; LARGE-AREA; FILMS; ZNO; FILTERS; DESIGN;
D O I
10.1021/acsami.2c05940
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
ABSTRACT: We demonstrate tunable structural color patterns that span the visible spectrum using atomic layer deposition (ALD). Asymmetric metal-dielectric-metal structures were sequentially deposited with nickel, zinc oxide, and a thin copper layer to form an optical cavity. The color response was precisely adjusted by tuning the zinc oxide (ZnO) thickness using ALD, which was consistent with model predictions. Owing to the conformal nature of ALD, this allows for uniform and tunable coloration of nonplanar three-dimensional (3D) objects, as exemplified by adding color to 3D-printed parts produced by metal additive manufacturing. Proper choice of inorganic layered structures and materials allows the structural color to be stable at elevated temperatures, in contrast to traditional paints. To print multiple colors on a single sample, polymer inhibitors were patterned in a desired geometry using electrohydrodynamic jet (e-jet) printing, followed by area-selective ALD in the unpassivated regions. The ability to achieve 3D color printing, both at the micro- and macroscales, provides a new pathway to tune the optical and aesthetic properties during additive manufacturing.
引用
收藏
页码:31099 / 31108
页数:10
相关论文
共 75 条
  • [11] Area-Selective Atomic Layer Deposition Patterned by Electrohydrodynamic Jet Printing for Additive Manufacturing of Functional Materials and Devices
    Cho, Tae H.
    Farjam, Nazanin
    Allemang, Christopher R.
    Pannier, Christopher P.
    Kazyak, Eric
    Huber, Carli
    Rose, Mattison
    Trejo, Orlando
    Peterson, Rebecca L.
    Barton, Kira
    Dasgupta, Neil P.
    [J]. ACS NANO, 2020, 14 (12) : 17262 - 17272
  • [12] Conformality in atomic layer deposition: Current status overview of analysis and modelling
    Cremers, Veronique
    Puurunen, Riikka L.
    Dendooven, Jolien
    [J]. APPLIED PHYSICS REVIEWS, 2019, 6 (02)
  • [13] Recent Advances in Atomic Layer Deposition
    Dasgupta, Neil P.
    Lee, Han-Bo-Ram
    Bent, Stacey F.
    Weiss, Paul S.
    [J]. CHEMISTRY OF MATERIALS, 2016, 28 (07) : 1943 - 1947
  • [14] Atomic Layer Deposition of Al-doped ZnO Films: Effect of Grain Orientation on Conductivity
    Dasgupta, Neil P.
    Neubert, Sebastian
    Lee, Wonyoung
    Trejo, Orlando
    Lee, Jung-Rok
    Prinz, Fritz B.
    [J]. CHEMISTRY OF MATERIALS, 2010, 22 (16) : 4769 - 4775
  • [15] Optical gain in single tensile-strained germanium photonic wire
    de Kersauson, M.
    El Kurdi, M.
    David, S.
    Checoury, X.
    Fishman, G.
    Sauvage, S.
    Jakomin, R.
    Beaudoin, G.
    Sagnes, I.
    Boucaud, P.
    [J]. OPTICS EXPRESS, 2011, 19 (19): : 17925 - 17934
  • [16] Selective Area Spatial Atomic Layer Deposition of ZnO, Al2O3, and Aluminum-Doped ZnO Using Poly(vinyl pyrrolidone)
    Ellinger, Carolyn R.
    Nelson, Shelby F.
    [J]. CHEMISTRY OF MATERIALS, 2014, 26 (04) : 1514 - 1522
  • [17] Additive nanomanufacturing - A review
    Engstrom, D. S.
    Porter, B.
    Pacios, M.
    Bhaskaran, H.
    [J]. JOURNAL OF MATERIALS RESEARCH, 2014, 29 (17) : 1792 - 1816
  • [18] Subtractive patterning: High-resolution electrohydrodynamic jet printing with solvents
    Farjam, Nazanin
    Cho, Tae H.
    Dasgupta, Neil P.
    Barton, Kira
    [J]. APPLIED PHYSICS LETTERS, 2020, 117 (13)
  • [19] Selective-area atomic layer deposition using poly(methyl methacrylate) films as mask
    Farm, Elina
    Kemell, Marianna
    Ritala, Mikko
    Leskela, Markku
    [J]. JOURNAL OF PHYSICAL CHEMISTRY C, 2008, 112 (40) : 15791 - 15795
  • [20] Selective-Area Atomic Layer Deposition Using Poly(vinyl pyrrolidone) as a Passivation Layer
    Farm, Elina
    Kemell, Marianna
    Santala, Eero
    Ritala, Mikko
    Leskela, Markku
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2010, 157 (01) : K10 - K14