Transparent conducting films of ZnO-ZrO2:: Structure and properties

被引：60
作者：
Qadri, SB [1 ]
Kim, H
Horwitz, JS
Chrisey, DB
机构：
[1] USN, Res Lab, Washington, DC 20375 USA
[2] George Washington Univ, Washington, DC 20052 USA
来源：
JOURNAL OF APPLIED PHYSICS | 2000年 / 88卷 / 11期
关键词：
D O I：
10.1063/1.1320032
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Transparent conducting films comprised of ZnO and ZrO2, with ZrO2 content varying between 0 and 10 wt%, have been deposited using pulsed-laser deposition. These films have resistivities ranging between 5.4x10(-4) and 5.6x10(-2) Omega cm with an optical transparency of more than 85% for the 250-900-nm-wavelength range. For films with ZrO2 content of less than 5 wt %, the hexagonal ZnO structure is observed with Zr substituting at the Zn site. The structural, optical, and electrical properties of these films make them suitable for high-temperature electronic applications. (C) 2000 American Institute of Physics. [S0021-8979(00)05723-6].
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页码：6564 / 6566
页数：3
相关论文
共 14 条
[1]   TRANSPARENT CONDUCTORS - A STATUS REVIEW [J].
CHOPRA, KL ;
MAJOR, S ;
PANDYA, DK .
THIN SOLID FILMS, 1983, 102 (01) :1-46
[2]   Fabrication and characterization of ITO thin films deposited by excimer laser evaporation [J].
Coutal, C ;
Azema, A ;
Roustan, JC .
THIN SOLID FILMS, 1996, 288 (1-2) :248-253
[3]  
DAWAR AL, 1984, J MATER SCI, V19, P1, DOI 10.1007/BF02403106
[4]   Spectroscopic and photoluminescence studies of a wide band gap insulating material:: Powdered and colloidal ZrO2 sols [J].
Emeline, A ;
Kataeva, GV ;
Litke, AS ;
Rudakova, AV ;
Ryabchuk, VK ;
Serpone, N .
LANGMUIR, 1998, 14 (18) :5011-5022
[5]  
HARTNAGEL H., 1995, Semiconducting Transparent Thin Films
[6]   Indium tin oxide thin films for organic light-emitting devices [J].
Kim, H ;
Piqué, A ;
Horwitz, JS ;
Mattoussi, H ;
Murata, H ;
Kafafi, ZH ;
Chrisey, DB .
APPLIED PHYSICS LETTERS, 1999, 74 (23) :3444-3446
[7]  
LIDE DR, 1991, HDB CHEM PHYSICS
[8]  
McMurdie H, 1986, POWDER DIFFRACTION J, V1, P76
[9]   GROUP-III IMPURITY DOPED ZINC-OXIDE THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING [J].
MINAMI, T ;
SATO, H ;
NANTO, H ;
TAKATA, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1985, 24 (10) :L781-L784
[10]   Electron beam deposition of ZrO2-ZnO films [J].
Qadri, SB ;
Skelton, EF ;
Lubitz, P ;
Nguyen, NV ;
Khan, HR .
THIN SOLID FILMS, 1996, 290 :80-83
12