Characterization of a Low-pressure Inductively Coupled Plasma Discharge Sustained in Ar/O2/N2 Ternary Mixtures and Evaluation of its Effect on Erosion of Biological Samples

被引：10

作者：

Kylian, Ondrej ^{[1
]}

Denis, Benjamin ^{[2
]}

Stapelmann, Katharina ^{[2
]}

Ruiz, Ana ^{[3
]}

Rauscher, Hubert ^{[3
]}

Rossi, Francois ^{[3
]}

机构：

[1] Charles Univ Prague, Fac Math & Phys, CR-18000 Prague 8, Czech Republic

[2] Ruhr Univ Bochum, Inst Elect Engn & Plasma Technol, D-44780 Bochum, Germany

[3] Commiss European Communities, Joint Res Ctr, Inst Hlth & Consumer Protect, I-21027 Ispra, VA, Italy

来源：

PLASMA PROCESSES AND POLYMERS | 2011年 / 8卷 / 12期

关键词：

amino acids; bacterial spores; decontamination; sterilization; ternary mixture; GLOW-DISCHARGE; OXYGEN PLASMA; STERILIZATION; INACTIVATION; SURFACES; BACTERIA; ELIMINATION; REMOVAL; DECONTAMINATION; SPORES;

D O I：

10.1002/ppap.201100086

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Detailed characterization of a low-pressure inductively coupled plasma discharge sustained in an Ar/O2/N2 ternary mixture is performed in this study. The main attention is devoted to the evaluation of the dependence of parameters important for treatment of biological samples (emission of UV radiation, plasma density, energy of charged particles, O atoms density, and substrate heating) on the working gas mixture composition. Subsequently, the capability of plasma sustained in ternary gas mixture to effectively etch biological contaminants is tested on examples of bacterial spores and poly-L-histidine.

引用

页码：1137 / 1145

页数：9

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