Grid spectral purity filters for suppression of infrared radiation in laser-produced plasma EUV sources

被引：13

作者：

Soer, Wouter A. ^{[1
]}

Jak, Martin J. J. ^{[1
]}

Yakunin, Andrei M. ^{[2
]}

van Herpen, Maarten M. J. W. ^{[1
]}

Banine, Vadim Y. ^{[2
]}

机构：

[1] Philips Res, High Tech Campus 4, NL-5656 AE Eindhoven, Netherlands

[2] ASML, NL-5504 DR Veldhoven, Netherlands

来源：

ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES | 2009年 / 7271卷

关键词：

EUV; EUV lithography; EUV source; laser-produced plasma; spectral purity; spectral purity filter; electromagnetic shielding; CO2; laser; infrared;

D O I：

10.1117/12.814231

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We have developed a grid-type spectral purity filter (SPF) for suppression of infrared radiation in laser-produced plasma (LPP) EUV sources for high-volume EUV lithography. The SPF is a silicon grid with sub-wavelength periodicity that is metalized to make it reflective for infrared radiation. EUV radiation is transmitted geometrically through the open area of the grid. The first prototype samples show an in-band EUV transmittance of 74% at normal incidence. Infrared spectrometry exhibits a clear cut-off behavior as expected, with a transmittance of <0.1% at a wavelength of 10.6 mu m. In a first power load test, a grid was exposed to a CO2 laser at 100 W/cm(2) in vacuum for 8 hours. Another grid was kept at 800 degrees C in a vacuum oven for 24 hours. Both grids remained structurally intact and maintained an infrared transmittance of <0.1%.

引用

页数：9

共 5 条

[1]

BANINE V, 2008, INT S EUVL

[2]

BIBISHKIN MS, 2008, P SPIE, V7025

[3]

Herpen M. M. J. W., 2008, OPT LETT, V33, P560

[4] EUV spectral purity filter: optical and mechanical design, gratings fabrication, and testing [J].

Kierey, H ;

Heidemann, K ;

Kleemann, B ;

Winters, R ;

Egle, W ;

Singer, W ;

Melzer, F ;

Wevers, R ;

Antoni, M .

ADVANCES IN MIRROR TECHNOLOGY FOR X-RAY, EUV LITHOGRAPHY, LASER, AND OTHER APPLICATIONS, 2004, 5193 :70-78

[5] Filter windows for EUV lithography [J].

Powell, FR ;

Johnson, TA .

EMERGING LITHOGRAPHIC TECHNOLOGIES V, 2001, 4343 :585-589

← 1 →