Instabilities of Ar/SF6 inductive plasma discharges

被引：21

作者：

Tuszewski, M ^{[1
]}

White, RR ^{[1
]}

机构：

[1] Los Alamos Natl Lab, Los Alamos, NM 87545 USA

来源：

JOURNAL OF APPLIED PHYSICS | 2003年 / 94卷 / 05期

关键词：

D O I：

10.1063/1.1600830

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Relaxation oscillations are studied in three low-pressure inductive plasma discharges operated with argon and sulfur hexafluoride gas mixtures. Two distinct phenomena, downstream instabilities and source oscillations, occur in certain domains of gas pressure, radio frequency power, and electronegative gas chemistry. The downstream instabilities develop at some location well below the plasma source. They are consistent with ion two-stream instabilities, in inductively coupled plasmas (ICPs) with sufficiently long downstream regions. Source oscillations consist of large amplitude density variations within the ICP plasma. They are consistent with capacitive to inductive mode transitions, in ICPs with sufficiently large capacitive currents. (C) 2003 American Institute of Physics.

引用

页码：2858 / 2863

页数：6

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