A closed-cycle, 1kHz pulse repetition frequency, HF(DF) laser

被引:7
|
作者
Harris, MR [1 ]
Morris, AV [1 ]
Gorton, EK [1 ]
机构
[1] Def Evaluat & Res Agcy, Malvern WR14 3PS, Worcs, England
来源
GAS AND CHEMICAL LASERS AND INTENSE BEAM APPLICATIONS | 1998年 / 3268卷
关键词
HF(DF) lasers; high repetition rate pulsed lasers; closed-cycle HF(DF) lasers;
D O I
10.1117/12.308073
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We describe the design and performance of a closed cycle, high pulse repetition frequency HF(DF) laser. A short duration, glow discharge is formed in a 10 SF6:1 H-2(D-2) gas mixture at a total pressure of similar to 110 torr. A pair of profiled electrodes define a 15 x 0.5 x 0.5 cm(3) discharge volume through which gas flow is forced in the direction transverse to the optical axis. A centrifugal fan provides adequate gas flow to enable operation up to 3kHz repetition frequency. The fan also passes the gas through a scrubber cell in which ground state HF(DF) is eliminated from the gas stream. An automated gas make-up system replenishes the spent fuel gases removed by the scrubber. Total gas admission is regulated by monitoring the system pressure, whilst the correct fuel balance is maintained through measurement of the discharge voltage. The HF(DF) generation rate is determined to be close to 5 x 10(19) molecules per second per watt of laser output. Typical mean laser output powers of up to 3 watts can be delivered for extended periods of time. The primary limitation to life is found to be the discharge pre-ionisation system. A distributed resistance corona pre-ioniser is shown to be advantageous when compared with an alternative are array scheme.
引用
收藏
页码:247 / 251
页数:5
相关论文
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  • [1] A closed cycle high repetition rate pulsed HF laser
    Harris, MR
    Morris, AV
    Gorton, EK
    XI INTERNATIONAL SYMPOSIUM ON GAS FLOW AND CHEMICAL LASERS AND HIGH-POWER LASER CONFERENCE, 1997, 3092 : 498 - 501
  • [2] A novel self-switched high repetition rate HF(DF) laser
    Harris, MR
    Jackson, DJ
    Milsom, PK
    GAS AND CHEMICAL LASERS AND INTENSE BEAM APPLICATIONS, 1998, 3268 : 308 - 313