Cathodoluminescence study of gadolinium-doped yttrium oxide thin films deposited by radio-frequency magnetron sputtering

被引:0
作者
Fowlkes, JD [1 ]
Rack, PD [1 ]
Bansal, R [1 ]
Fitz-Gerald, JM [1 ]
机构
[1] Univ Tennessee, Dept Mat Sci & Engn, Knoxville, TN 37996 USA
来源
NEW APPLICATIONS FOR WIDE-BANDGAP SEMICONDUCTORS | 2003年 / 764卷
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T [工业技术];
学科分类号
08 ;
摘要
A multi-layer gadolinium-doped yttrium oxide thin film was deposited in a combinatorial fashion on a Si (001) substrate using radio-frequency magnetron sputtering. Alternating layers of Y2O3 and Gd were deposited for a total of 9 layers. The film was homogenized in composition by an 850 C 12 hour thermal treatment producing a range of composition from Y1.96Gd0.04O3 - Y1.54Gd0.46O3 in a single film. Ultraviolet emission with a peak wavelength at 314-315nm was observed from the gadolinium S-8(7/2) - P-6(7/2) transition via cathodoluminescence (CL) excitation. The CL-induced intensity was found to be maximum at 9 at% Gd (Y1.82Gd0.18O3) and an optimized electron probe of V-acc = 13 keV was determined for the 1 mum thick thin film. Gadolinium activator saturation was observed for sample current density greater than 0.03 muA/cm(2). Non- radiative decay via thermal pathways is suspected for the observed activator saturation.
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页码:419 / 424
页数:6
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