Second-order Talbot effect with entangled photon pairs (vol 80, 043820, 2009)

被引：3
作者：
Luo, Kai-Hong
Wen, Jianming
Chen, Xi-Hao
Liu, Qian
Xiao, Min
Wu, Ling-An
机构：
来源：
PHYSICAL REVIEW A | 2011年 / 83卷 / 02期
关键词：
D O I：
10.1103/PhysRevA.83.029902
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
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页数：2
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共 5 条
  • [1] Quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit
    Boto, AN
    Kok, P
    Abrams, DS
    Braunstein, SL
    Williams, CP
    Dowling, JP
    [J]. PHYSICAL REVIEW LETTERS, 2000, 85 (13) : 2733 - 2736
  • [2] Two-photon diffraction and quantum lithography
    D'Angelo, M
    Chekhova, MV
    Shih, Y
    [J]. PHYSICAL REVIEW LETTERS, 2001, 87 (01)
  • [3] Second-order Talbot effect with entangled photon pairs
    Luo, Kai-Hong
    Wen, Jianming
    Chen, Xi-Hao
    Liu, Qian
    Xiao, Min
    Wu, Ling-An
    [J]. PHYSICAL REVIEW A, 2009, 80 (04):
  • [4] LUO KH, 2009, BMC NEUROLOGY, V80
  • [5] Intense nonclassical light: Controllable two-photon Talbot effect
    Ooi, C. H. Raymond
    Lan, Boon Leong
    [J]. PHYSICAL REVIEW A, 2010, 81 (06):
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