How to measure atomic diffusion processes in the sub-nanometer range

被引:40
作者
Schmidt, H. [1 ,3 ,4 ]
Gupta, M. [2 ,3 ,4 ]
Gutberlet, T. [3 ,4 ]
Stahn, J. [3 ,4 ]
Bruns, A. [5 ]
机构
[1] Tech Univ Clausthal, Mat Phys Grp, Inst Met, D-38678 Clausthal Zellerfeld, Germany
[2] Bhabha Atom Res Ctr, UGC DAE Consoritum Sci Res, Bombay 400085, Maharashtra, India
[3] Swiss Fed Inst Technol, Neutron Scattering Lab, CH-5232 Villigen, Switzerland
[4] Paul Scherrer Inst, CH-5232 Villigen, Switzerland
[5] Res Ctr Karlsruhe GmbH, Inst Mat Res 3, D-76021 Karlsruhe, Germany
关键词
diffusion; neutron reflectometry; amorphous materials;
D O I
10.1016/j.actamat.2007.10.005
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Self-diffusion of the atomic constituents in the solid slate is a fundamental transport process hat controls various materials properties. With established methods of diffusivity determination it is only possible to measure diffusion processes on a length scale down to 10 nm at corresponding diffusivities of 10(-23) m(2) s(-1). However, for complex materials like amorphous or nano-structured solids the given values are often not sufficient for a proper characterization. Consequently, it is necessary to detect diffusion length well below I nm. Here, we present the method of neutron reflectometry on isotope multilayers. For two model systems, an amorphous semiconductor and an amorphous metallic alloy, the efficiency of this method is demonstrated to detect minimum diffusion lengths of only 0.6-0.7 nm. It is further shown that diffusivities can be derived which are more than two orders of magnitude lower than those obtainable with conventional methods. Prospects of this method in order to solve actual kinetic problems in materials science are given. (c) 2007 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码:464 / 470
页数:7
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