Deposition of nanocomposite Zr-ZrO2 films by reactive cathodic vacuum arc evaporation

被引：7

作者：

Cyviene, E ^{[1
]}

Laurikaitis, M ^{[1
]}

Dudonis, J ^{[1
]}

机构：

[1] Kaunas Univ Technol, Dept Phys, LT-51368 Kaunas, Lithuania

来源：

MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 2005年 / 118卷 / 1-3期

关键词：

cathodic arc evaporation; zirconium; zirconia;

D O I：

10.1016/j.mseb.2004.12.036

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Cathodic arc evaporation is the most versatile PVD coating technology. The process uses arc evaporation to create highly ionized plasma. This permits adherent coatings to be applied to the low temperature substrates. The results of a study of the Zr-ZrO2 thin films deposition process and the technological development of cathodic arc are presented there. The studies of the oxygen flow influence and of the substrate position on film deposition were carried out. The special substrate position in the chamber allows escaping "droplets" or macros and macro particles on the coating. ZrO2 film with nano Zr inserts is obtained in some special cases. The Zr-ZrO2, thin films were deposited on glass substrates after complete analysis of the arc deposition process. The structure and film optical properties were investigated by XRD, spectrophotometry, respectively. Other materials and composites can be deposited on the basis of these results. (c) 2004 Elsevier B.V. All rights reserved.

引用

页码：238 / 241

页数：4

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