Displacement damage degradation of ion-induced charge in Si pin photodiode

被引:19
作者
Onoda, S
Hirao, T
Laird, JS
Mori, H
Itoh, H
Wakasa, T
Okamoto, T
Koizumi, Y
机构
[1] Tokai Univ, Grad Sch Engn, Course Appl Sci, Kanagawa 2591292, Japan
[2] Japan Atom Energy Res Inst, Dept Mat Dev, Serv Environm Mat Lab, Gunma 3701292, Japan
关键词
displacement damage effect; single event effect; non-ionizing energy loss; collected charge;
D O I
10.1016/S0168-583X(03)00790-0
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Photonic devices operating in space must exhibit high-radiation hardness due to prolonged exposure to high-energy radiation fields. The device performance can be influenced by both the transient effect of electron-hole plasma generation due to stopping of high-energy particles, and the accumulated effect of damage introduced by a flux of particles. The complex relationship between the two is an increasingly important area of research. Here we investigate charge collection characteristics of in situ ion beam induced damaged samples by measuring single event transient currents induced by heavy ions. Results from this study suggest that the ion-induced charge degradation can be predicted for any ion species and energy using the concept of non-ionizing energy loss and displacement damage dose. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:444 / 447
页数:4
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