Reaction at the interface between Si melt and a Ba-doped silica crucible

被引:17
作者
Huang, XM
Koh, SJ
Wu, KH
Chen, MW
Hoshikawa, T
Hoshikawa, K
Uda, S
机构
[1] Tohoku Univ, Mat Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan
[2] Shinshu Univ, Fac Engn, Wakasato, Nagano 3800928, Japan
[3] Shinshu Univ, Fac Educ, Nagano 3808544, Japan
关键词
Ba doping; CZ-Si crystal growth; brownish rings; cristobalite; silica crucible;
D O I
10.1016/j.jcrysgro.2005.01.101
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
A silica crucible with Ba doping at inner surface was used for growing a Czochralski Si (CZ-Si) crystal. Reaction at the interface between Si melt and a Ba-doped silica crucible was investigated. It was found that generation of brownish rings could be suppressed effectively by Ba doping with proper concentration. Almost no brownish rings formed at a silica crucible after Si crystal growth when Ba concentration was more than 100 ppm. Instead of the brownish rings, a white uniform cristobalite layer formed at the inner surface of the Ba-doped silica crucible. The surface of the cristobalite layer was very smooth and no traces of release of flakes or particles could be identified from the surface even after the Si crystal growth. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:154 / 161
页数:8
相关论文
共 22 条
  • [11] In situ observation of etching processes of silica glasses by silicon melts
    Ikari, A
    Matsuo, S
    Terashima, K
    Kimura, S
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (6A): : 3547 - 3552
  • [12] Evolution of cristobalite clusters on silica glass surfaces in molten silicon
    Imai, H
    Hirashima, H
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2000, 147 (03) : 1182 - 1185
  • [13] PHONONS IN AMORPHOUS SILICA
    LAUGHLIN, RB
    JOANNOPOULOS, JD
    [J]. PHYSICAL REVIEW B, 1977, 16 (06): : 2942 - 2952
  • [14] THE INFLUENCE OF DOPANTS ON THE REACTION BETWEEN LIQUID SILICON AND SILICA
    LIU, Z
    CARLBERG, T
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (03) : 844 - 849
  • [15] REACTIONS BETWEEN LIQUID SILICON AND VITREOUS SILICA
    LIU, ZS
    CARLBERG, T
    [J]. JOURNAL OF MATERIALS RESEARCH, 1992, 7 (02) : 352 - 358
  • [16] PHILLIPS RJ, Patent No. 6461427
  • [17] Determination of oxygen dissolution rate from silica to silicon melt at solid (silica glass)/melt/gas triple junction
    Sakai, S
    Okano, Y
    Huang, XM
    Hoshikawa, K
    [J]. ELECTROCHEMICAL AND SOLID STATE LETTERS, 2002, 5 (08) : G72 - G74
  • [18] Growth of silicon crystal with a diameter of 400 mm and weight of 400 kg
    Shiraishi, Y
    Takano, K
    Matsubara, J
    Iida, T
    Takase, N
    Machida, N
    Kuramoto, M
    Yamagishi, H
    [J]. JOURNAL OF CRYSTAL GROWTH, 2001, 229 (01) : 17 - 21
  • [19] WATER AND ITS RELATION TO BROKEN BOND DEFECTS IN FUSED SILICA
    STOLEN, RH
    WALRAFEN, GE
    [J]. JOURNAL OF CHEMICAL PHYSICS, 1976, 64 (06) : 2623 - 2631
  • [20] Challenges for economical growth of high quality 300 mm CZ Si crystals
    Tomzig, E
    von Ammon, W
    Dornberger, E
    Lambert, U
    Zulehner, W
    [J]. MICROELECTRONIC ENGINEERING, 1999, 45 (2-3) : 113 - 125