ALD high-k layer grating couplers for single and double slot on-chip SOI photonics

被引：5

作者：

Naiini, Maziar M. ^{[1
]}

Henkel, Christoph ^{[1
]}

Mahn, Gunnar B. ^{[1
]}

Ostling, Mikael ^{[1
]}

机构：

[1] KTH Royal Inst Technol, Sch Informat & Commun Technol, SE-164 Kista, Sweden

来源：

SOLID-STATE ELECTRONICS | 2012年 / 74卷

关键词：

Integrated photonics; Grating couplers; High-k thin films; Slot waveguides; Fabrication and characterization; WAVE-GUIDES; CONFINING LIGHT; SILICON; INJECTION;

D O I：

10.1016/j.sse.2012.04.012

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

State of the art grating couplers for horizontal single and double slot waveguides are presented; in these devices the input signal is transmitted from a single mode optical fiber to silicon on insulator slot waveguide. In the waveguides, atomic layer deposited (ALD) high-k dielectrics form the low refractive index slot. It is demonstrated that a fully etched design combined with precision of ALD result in highly reproducible devices with theoretical efficiency variations less than 1%. Devices have a peak calculated coupling efficiency of 24% at 1.55 mu m. In order to achieve an optimal design, optical properties of high-k films are studied by spectroscopic ellipsometry. Measured refractive indices show variations from reference values, originated from film variation in densities. Chips with a test slot material are fabricated and the optical efficiency of the couplers is characterized. The maximum measured coupling efficiency of the couplers is 18.5%. (c) 2012 Elsevier Ltd. All rights reserved.

引用

页码：58 / 63

页数：6

共 8 条

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