Spectroscopic ellipsometry and electrical studies of as-grown and rapid thermal oxidized Si1-x-yGexCy films

被引:3
作者
Choi, WK
Feng, W
Bera, LK
Yang, CY
Mi, J
机构
[1] Natl Univ Singapore, Dept Elect & Comp Engn, Microelect Lab, Singapore 117576, Singapore
[2] Santa Clara Univ, Microelect Lab, Santa Clara, CA 95053 USA
关键词
D O I
10.1063/1.1413715
中图分类号
O59 [应用物理学];
学科分类号
摘要
Transmission electron microscopy results showed the formation of SiC precipitation in a rapid thermally oxidized (RTO) Si1-x-yGexCy sample with high-C content. The spectroscopic ellipsometry results showed that the E-1 gap increased and E-2 gap decreased as the C concentration increased. For the oxidized samples, the amplitude of the E-2 transitions reduced rapidly and the E-1 transition shifted to a lower energy. The reduction in the E-2 transitions was due to the presence of the oxide layer. A high-Ge content layer and the low-C content in the RTO films accounted for the E-1 shift to lower energy. The electrical measurements showed that RTO at 800 degreesC did not improve the oxide quality as compared to 1000 degreesC. (C) 2001 American Institute of Physics.
引用
收藏
页码:5819 / 5824
页数:6
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