High temperature microbalances based on GaPO4

被引：5

作者：

Thanner, H ^{[1
]}

Krempl, PW ^{[1
]}

Krispel, F ^{[1
]}

Reiter, C ^{[1
]}

Selic, R ^{[1
]}

机构：

[1] AVL List GMBH, A-8020 Graz, Austria

来源：

ANNALES DE CHIMIE-SCIENCE DES MATERIAUX | 2001年 / 26卷 / 01期

关键词：

D O I：

10.1016/S0151-9107(01)90030-3

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Two different microbalance applications, based on temperature compensated thickness shear mode resonators (single rotated Y-cuts), were studied. In the first case, the film thickness growth during the sputter process was monitored. The measured frequency shift was in excellent agreement with the applied theory. In the second case, the selfcleaning by heating the crystal up to 650 degreesC after contamination with particulates was demonstrated.

引用

页码：161 / 164

页数：4