Imaging at the Nanoscale With Practical Table-Top EUV Laser-Based Full-Field Microscopes

被引：14

作者：

Brizuela, Fernando ^{[1
]}

Howlett, Isela D. ^{[1
,2
]}

Carbajo, Sergio ^{[1
,2
]}

Peterson, Diana ^{[1
]}

Sakdinawat, A. ^{[3
]}

Liu, Yanwei ^{[3
]}

Attwood, David T. ^{[3
]}

Marconi, Mario C. ^{[1
,2
]}

Rocca, Jorge J. ^{[1
,2
]}

Menoni, Carmen S. ^{[1
,2
]}

机构：

[1] Colorado State Univ, Dept Elect & Comp Engn, Ft Collins, CO 80523 USA

[2] Colorado State Univ, Engn Res Ctr Extreme Ultraviolet Sci & Technol, Ft Collins, CO 80523 USA

[3] Univ Calif Berkeley, Dept Elect Engn & Comp Sci, Berkeley, CA 94720 USA

来源：

IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS | 2012年 / 18卷 / 01期

基金：

美国国家科学基金会;

关键词：

Extreme ultraviolet (EUV) lasers; imaging; microscopy; nanotechnology; X-RAY MICROSCOPY; EXTREME-ULTRAVIOLET LASER; NICKEL-LIKE CADMIUM; NM RESOLUTION; MULTILAYER DEFECTS; ACTINIC INSPECTION; ZONE PLATES; MASKS; ILLUMINATION;

D O I：

10.1109/JSTQE.2011.2158393

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The demonstration of table-top high average power extreme-ultraviolet (EUV) lasers combined with the engineering of specialized optics has enabled the demonstration of full-field microscopes that have achieved tens of nanometer spatial resolution. This paper describes the geometry of the EUV microscopes tailored to specific imaging applications. The microscope illumination characteristics are assessed and an analysis on the microscope's spatial resolution is presented. Examples of the capabilities of these table-top EUV aerial microscopes for imaging nanostructures and surfaces are presented.

引用

页码：434 / 442

页数：9

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