Scaling and Modeling of High Temperature 4H-SiC p-i-n Photodiodes

被引:5
作者
Hou, Shuoben [1 ]
Hellstrom, Per-Erik [1 ]
Zetterling, Carl-Mikael [1 ]
Ostling, Mikael [1 ]
机构
[1] KTH Royal Inst Technol, Sch Informat & Commun Technol, S-16440 Kista, Sweden
关键词
4H-SiC; photodiode; high temperature; scaling; SEPARATE ABSORPTION; ARRAY;
D O I
10.1109/JEDS.2017.2785618
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
4H-SiC p-i-n photodiodes with various mesa areas (40 000 mu m(2), 2500 mu m(2), 1600 mu m(2), and 400 mu m(2)) have been fabricated. Both C-V and I-V characteristics of the photodiodes have been measured at room temperature, 200 degrees C, 400 degrees C, and 500 degrees C. The capacitance and photo current (at 365 nm) of the photodiodes are directly proportional to the area. However, the dark current density increases as the device is scaled down due to the perimeter surface recombination effect. The photo to dark current ratio at the full depletion voltage of the intrinsic layer (-2.7 V) of the photodiode at 500 degrees C decreases similar to 7 times as the size of the photodiode scales down 100 times. The static and dynamic behavior of the photodiodes are modeled with SPICE parameters at the four temperatures.
引用
收藏
页码:139 / 145
页数:7
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