Solubility of carbon dioxide and cosolvents in a photoresist polymer

被引：2

作者：

Balashova, Ida M. ^{[1
]}

Russell, Marc C. ^{[1
]}

Danner, Ronald P. ^{[1
]}

Duda, J. Larry ^{[1
]}

机构：

[1] Penn State Univ, Dept Chem Engn, Ctr Study Polymer Syst, University Pk, PA 16802 USA

来源：

JOURNAL OF APPLIED POLYMER SCIENCE | 2008年 / 108卷 / 03期

关键词：

diffusion; photoresists; swelling;

D O I：

10.1002/app.27849

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Solubility and diffusivity of cosolvents and carbon dioxide in a photoresist polymer have been measured below the glass transition temperature by the inverse gas chromatography and static capsule methods over a temperature range of 75-100 degrees C and pressures up to 7000 kPa. The results showed that presence of even low pressures of CO2 increased the solubility and diffusivity of the cosolvents studied. Experiments in which exposure of the polymer to CO2 was cycled on and off indicated that the free volume introduced by the CO2 persisted in the polymer for a significant time after removal of the CO2. (c) 2008 Wiley Periodicals, Inc.

引用

页码：1865 / 1870

页数：6

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