Polycrystalline diamond RF MOSFET with MoO3 gate dielectric

被引:9
作者
Ren, Zeyang [1 ]
Zhang, Jinfeng [1 ]
Zhang, Jincheng [1 ]
Zhang, Chunfu [1 ]
Chen, Dazheng [1 ]
Quan, Rudai [1 ]
Yang, Jiayin [1 ]
Lin, Zhiyu [1 ]
Hao, Yue [1 ]
机构
[1] Xidian Univ, Sch Microelect, State Key Discipline Lab Wide Band Gap Semicond T, Xian 710071, Shaanxi, Peoples R China
来源
AIP ADVANCES | 2017年 / 7卷 / 12期
基金
中国国家自然科学基金;
关键词
CUTOFF FREQUENCY;
D O I
10.1063/1.5004475
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We report the radio frequency characteristics of the diamond metal-oxide-semiconductor field effect transistor with MoO3 gate dielectric for the first time. The device with 2-mu m gate length was fabricated on high quality polycrystalline diamond. The maximum drain current of 150 mA/mm at V-GS = -5 V and the maximum transconductance of 27 mS/mm were achieved. The extrinsic cutoff frequency of 1.2 GHz and the maximum oscillation frequency of 1.9 GHz have been measured. The moderate frequency characteristics are attributed to the moderate transconductance limited by the series resistance along the channel. We expect that the frequency characteristics of the device can be improved by increasing the magnitude of g(m), or fundamentally decreasing the gate-controlled channel resistance and series resistance along the channel, and down-scaling the gate length. (c) 2017 Author(s).
引用
收藏
页数:7
相关论文
共 24 条
  • [1] [Anonymous], APPL PHYS LETT
  • [2] Investigating the properties of interfacial layers in planar Schottky contacts on hydrogen-terminated diamond through direct current/small-signal characterization and radial line small-signal modelling
    Cappelluti, F.
    Ghione, G.
    Russell, S. A. O.
    Moran, D. A. J.
    Verona, C.
    Limiti, E.
    [J]. APPLIED PHYSICS LETTERS, 2015, 106 (10)
  • [3] Work function recovery of air exposed molybdenum oxide thin films
    Irfan, Irfan
    Turinske, Alexander James
    Bao, Zhenan
    Gao, Yongli
    [J]. APPLIED PHYSICS LETTERS, 2012, 101 (09)
  • [4] High carrier mobility in single-crystal plasma-deposited diamond
    Isberg, J
    Hammersberg, J
    Johansson, E
    Wikström, T
    Twitchen, DJ
    Whitehead, AJ
    Coe, SE
    Scarsbrook, GA
    [J]. SCIENCE, 2002, 297 (5587) : 1670 - 1672
  • [6] Role of the deep-lying electronic states of MoO3 in the enhancement of hole-injection in organic thin films
    Kroeger, M.
    Hamwi, S.
    Meyer, J.
    Riedl, T.
    Kowalsky, W.
    Kahn, A.
    [J]. APPLIED PHYSICS LETTERS, 2009, 95 (12)
  • [7] Impedance analysis of Al2O3/H-terminated diamond metal-oxide-semiconductor structures
    Liao, Meiyong
    Liu, Jiangwei
    Sang, Liwen
    Coathup, David
    Li, Jiangling
    Imura, Masataka
    Koide, Yasuo
    Ye, Haitao
    [J]. APPLIED PHYSICS LETTERS, 2015, 106 (08)
  • [8] Over 20-GHz cutoff frequency submicrometer-gate diamond MISFETs
    Matsudaira, H
    Miyamoto, S
    Ishizaka, H
    Umezawa, H
    Kawarada, H
    [J]. IEEE ELECTRON DEVICE LETTERS, 2004, 25 (07) : 480 - 482
  • [9] Scaling of Hydrogen-Terminated Diamond FETs to Sub-100-nm Gate Dimensions
    Moran, David A. J.
    Fox, Oliver J. L.
    McLelland, Helen
    Russell, Stephen
    May, Paul W.
    [J]. IEEE ELECTRON DEVICE LETTERS, 2011, 32 (05) : 599 - 601
  • [10] Growth strategies for large and high quality single crystal diamond substrates
    Nad, Shreya
    Gu, Yajun
    Asmussen, Jes
    [J]. DIAMOND AND RELATED MATERIALS, 2015, 60 : 26 - 34