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Long wavelength photoluminescence emission from InAs quantum dots embedded in GaAs matrix
被引:0
|作者:
Saravanan, S
[1
]
Shimizu, H
[1
]
机构:
[1] ATR Wave Engn Labs, Dept Nonlinear Sci, 2-2-2 Hikaridai, Keihanna Sci City, Kyoto 6190288, Japan
来源:
PHOTONICS: DESIGN, TECHNOLOGY, AND PACKAGING II
|
2006年
/
6038卷
关键词:
molecular beam epitaxy;
atomic force microscopy;
semiconducting III-V materials;
InAs quantum dots;
photoluminescence;
FWHM;
D O I:
10.1117/12.637589
中图分类号:
O43 [光学];
学科分类号:
070207 ;
0803 ;
摘要:
Light emission with a wavelength of 1272 nm at room temperature (RT) from self-assembled InAs quantum dots embedded in the GaAs matrix has been obtrained. Growth interruption during the formation of InAs quantum dots (QDs) on a GaAs (100) substrate has been investigated in detail. 1.9 mono layers (MLs) of an InAs QD nucleation layer was grown continuously to form a "seed" with high density. Further, the supply of up to 3 MLs of InAs with a growth interruption of 15 s for every 0.11 ML showed that photoluminescence intensity was improved by 23 times and red-shifted the photoluminescence emission nearly 42 nm. The continuous growth up to 1.9 MLs helped to double the dot density. 3.3 MLs of InAs embedded in a GaAs matrix, grown using interruption showed a strong RT photoluminescence peak at around 1272 nm with a very narrow FWHM of 27.1 meV.
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