A compact and low loss Y-junction for submicron silicon waveguide

被引：330

作者：

Zhang, Yi ^{[1
]}

Yang, Shuyu ^{[1
]}

Lim, Andy Eu-Jin ^{[2
]}

Lo, Guo-Qiang ^{[2
]}

Galland, Christophe ^{[1
]}

Baehr-Jones, Tom ^{[1
]}

Hochberg, Michael ^{[1
,2
,3
]}

机构：

[1] Univ Delaware, Dept Elect & Comp Engn, Newark, DE 19716 USA

[2] ASTAR, Inst Microelect, Singapore, Singapore

[3] Natl Univ Singapore, Dept Elect & Comp Engn, Singapore 117597, Singapore

来源：

OPTICS EXPRESS | 2013年 / 21卷 / 01期

关键词：

PHOTONIC WIRE; SPLITTER;

D O I：

10.1364/OE.21.001310

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We designed a compact, low-loss and wavelength insensitive Y-junction for submicron silicon waveguide using finite difference time-domain (FDTD) simulation and particle swarm optimization (PSO), and fabricated the device in a 248 nm complementary metal-oxide-semiconductor (CMOS) compatible process. Measured average insertion loss is 0.28 +/- 0.02 dB, uniform across an 8-inch wafer. The device footprint is less than 1.2 mu m x 2 mu m, an order of magnitude smaller than typical multimode interferometers (MMIs) and directional couplers. (C)2013 Optical Society of America

引用

页码：1310 / 1316

页数：7

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