Evaluating the Robustness of Top Coatings Comprising Plasma-Deposited Fluorocarbons in Electrowetting Systems

被引:10
作者
Papageorgiou, Dimitrios P. [1 ]
Koumoulos, Elias P. [1 ]
Charitidis, Costas A. [1 ]
Boudouvis, Andreas G. [1 ]
Papathanasiou, Athanasios G. [1 ]
机构
[1] Natl Tech Univ Athens, Sch Chem Engn, GR-15780 Athens, Greece
基金
欧洲研究理事会;
关键词
Electrowetting; plasma fluorocarbon deposition; hydrophobic coating; nanoscratch; adhesion strength; DIELECTRIC-BREAKDOWN STRENGTH; CONTACT-ANGLE SATURATION; FILMS; VOLTAGE; CONNECTION; CONSTANT; POLYMERS; CHARGE; LENS;
D O I
10.1163/156856111X600226
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
Thin dielectric stacks comprising a main insulating layer and a hydrophobic top coating are commonly used in low voltage electrowetting systems. However, in most cases, thin dielectrics fail to endure persistent electrowetting testing at high voltages, namely beyond the saturation onset, as electrolysis indicates dielectric failure. Careful sample inspection via optical microscopy revealed possible local delamination of the top coating under high electric fields. Thus, improvement in the adhesion strength of the hydrophobic top coating to the main dielectric is attempted through a plasma-deposited fluorocarbon interlayer. Interestingly enough the proposed dielectric stack exhibited (a) resistance to dielectric breakdown, (b) higher contact angle modulation range and (c) electrowetting cycle reversibility. Appearance of electrolysis in the saturation regime is inhibited, suggesting the use of this hydrophobic dielectric stack for the design of more efficient electrowetting systems. The possible causes of the improved performance are investigated by nanoscratch characterization. (C) Koninklijke Brill NV, Leiden, 2011
引用
收藏
页码:2001 / 2015
页数:15
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