Current-voltage and reverse recovery characteristics of bulk GaN p-i-n rectifiers

被引:27
作者
Irokawa, Y [1 ]
Luo, B
Kim, J
LaRoche, JR
Ren, F
Baik, KH
Pearton, SJ
Pan, CC
Chen, GT
Chyi, JI
Park, SS
Park, YJ
机构
[1] Toyota Cent Res & Dev Labs Inc, Aichi 4801192, Japan
[2] Univ Florida, Dept Chem Engn, Gainesville, FL 32611 USA
[3] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[4] Natl Cent Univ, Dept Elect Engn, Chungli 32054, Taiwan
[5] Samsung Adv Inst Technol, Suwon, South Korea
关键词
D O I
10.1063/1.1611624
中图分类号
O59 [应用物理学];
学科分类号
摘要
p-i-n rectifiers were fabricated on epitaxial layers grown on free-standing GaN substrates. The forward turn-on voltage, V-F was similar to5 V at 300 K and displayed a positive temperature coefficient. The specific on-state resistance (R-ON) was similar to5 mOmega cm(2) at 300 K, with an ideality factor of similar to2 and activation energy for low forward current density of similar to1.6 eV. This is consistent with carrier recombination in the space charge region via a midgap deep level. The figure-of-merit, V-B(2)/R-ON, where V-B is the reverse breakdown voltage, was 0.32 MW cm(-2). The reverse recovery time was less than or equal to600 ns at 300 K. The improved forward characteristics relative to previous heteroepitaxial p-i-n GaN rectifiers show the advantages of employing a GaN substrate to make a true vertical transport geometry device. (C) 2003 American Institute of Physics.
引用
收藏
页码:2271 / 2273
页数:3
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