YSZ thermal barrier coatings by MOCVD

被引：0

作者：

Varanasi, VG ^{[1
]}

Besmann, TM ^{[1
]}

Henry, JJ ^{[1
]}

Starr, TL ^{[1
]}

Xu, W ^{[1
]}

Anderson, TJ ^{[1
]}

机构：

[1] Univ Florida, Dept Chem Engn, Gainesville, FL 32611 USA

来源：

HIGH TEMPERATURE CERAMIC MATRIX COMPOSITES 5 | 2005年

关键词：

D O I：

暂无

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

MOCVD process development utilized a cold wall reactor with liquid delivery of a metal-organic precursor solution to deposit yttria-stabilized zirconia. At high temperature (> 950 degrees C) the deposition process is transport limited and the rate is ultimately controlled by the solubility of the selected precursor in the selected solvent. Proposed, thick thermal barrier coatings with a columnar structure have been successfully deposited on developmental FeCrAlY material and resistance to spallation during thermal cycling in initial testing has been demonstrated on preoxidized surfaces.

引用

页码：595 / 601

页数：7

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