The long-term annealing of the cluster damage in high resistivity n-type silicon

被引:6
作者
Kuhnke, A [1 ]
机构
[1] Univ Hamburg, Inst Expt Phys 2, D-22761 Hamburg, Germany
关键词
deep-level transient spectroscopy (DLTS); radiation damage; radiation hardness; silicon detectors;
D O I
10.1109/TNS.2002.803923
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The annealing of the cluster damage after fast neutron and high energy pi(+)-pion irradiations is studied employing the deep-level transient spectroscopy (DLTS) method. The clusters consist mainly of divacancies. However, other unidentified defects contribute to the signal of the single negative charge state of the divacancy. The unidentified defects are located in the cluster region. Strain and deformation fields are assumed to change the emission parameters of the defects in the cluster region resulting in a distribution of energy states. Simulations of the DLTS signals, which take into account an exponential density distribution of energy states, were carried out. During annealing a decay of divacancies and the other unidentified defects is observed.
引用
收藏
页码:2599 / 2604
页数:6
相关论文
共 33 条
[1]   Deep-level transient spectroscopy studies of silicon detectors after 24 GeV proton irradiation and 1 MeV neutron irradiation [J].
Ahmed, M ;
Watts, SJ ;
Matheson, J ;
Holmes-Siedle, A .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2001, 457 (03) :588-594
[2]  
[Anonymous], 1999, THESIS U HAMBURG
[3]  
ANTONOVA IV, 1989, SOV PHYS SEMICOND+, V23, P671
[4]  
BERMAN LS, 1992, SOV PHYS SEMICOND+, V26, P847
[5]  
BERMAN LS, 1987, SOV PHYS SEMICOND+, V21, P84
[6]   ENERGY-DEPENDENCE OF PROTON-INDUCED DISPLACEMENT DAMAGE IN SILICON [J].
BURKE, EA .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1986, 33 (06) :1276-1281
[7]  
COHAUSZ L, PHYS TECH
[8]   Bulk damage effects in irradiated silicon detectors due to clustered divacancies [J].
Gill, K ;
Hall, G ;
MacEvoy, B .
JOURNAL OF APPLIED PHYSICS, 1997, 82 (01) :126-136
[9]  
GILL K, 1999, ERRATUM J APPL PHYS, V85
[10]   Vacancy aggregates in silicon [J].
Hastings, JL ;
Estreicher, SK ;
Fedders, PA .
PHYSICAL REVIEW B, 1997, 56 (16) :10215-10220